Femtosecond Laser Grid Precision Cutting: Application Breakthroughs in TEM Grids, TWT Grids & Ion Source Grids

High-performance grids are critical components in numerous cutting-edge applications, covering fields such as Transmission Electron Microscopes (TEM), Traveling Wave Tubes (TWT), ion sources, and advanced filtration systems. The market demand for grids with higher precision, greater reliability, and enhanced customization is growing rapidly. However, traditional manufacturing methods often struggle to meet the stringent requirements of these applications, especially when processing hard, brittle, or heat-sensitive materials, leading to issues like photochemical etching mask misalignment and poor surface finish after EDM processing.

With its advanced femtosecond laser micro-nano processing solutions, MONO is revolutionizing the manufacturing of these key components. Our technology enables the production of complex grid structures with unparalleled precision, minimal heat-affected zones (HAZ), and excellent material adaptability.

Application Analysis: Why High-Precision Grids Matter?

The core value of grids lies in "achieving precise regulation of particles (electrons/ions) or signals through structural design," widely used in high-tech fields such as semiconductors, national defense, and scientific research.

1. Transmission Electron Microscope (TEM) Grids:

• Key Role: As critical consumables for electron microscopes, TEM grids (also known as "TEM垫片栅网") primarily function to support nano-scale thin samples (e.g., biological sections, nanoparticles, semiconductor films) while ensuring unobstructed and interference-free electron beam penetration for high-resolution imaging. The precision of their grid structure directly determines sample fixation stability and imaging clarity.

• Technical Requirements: Standard diameter of 3.05mm, mesh "count" (number of holes per inch) ranging from 50 to 400, corresponding to hole diameters of 100μm-25μm to meet different sample size needs; grid bar width tolerance must be controlled within ±2μm, with burr-free and non-deformed cutting edges (to avoid electron beam obstruction), while ensuring high grid opening rate to maximize electron penetration efficiency; compatible with copper, nickel, tungsten, etc.

• Application Solution: Enables cutting 90μm square grids on 50μm thick tungsten sheets with "burr-free and stress-free deformation," bar width tolerance of ±1μm, suitable for supporting high-hardness samples.

2. Traveling Wave Tube (TWT) Grids:

• Core Value: Traveling wave tubes are "high-energy signal amplifiers" in national defense radars, communication satellites, and electronic warfare equipment, and TWT grids (also called "control grids") serve as their "electron beam control valves." By adjusting grid voltage, they precisely control the flow speed and trajectory of electrons from the cathode to the anode, enabling efficient amplification of RF signals while avoiding energy loss caused by electron beam divergence.

• Technical Requirements: 3D hemispherical structure, grid hole diameter of 10-50μm, surface finish Ra＜0.4μm (to reduce electron scattering), requiring refractory metals like molybdenum and tungsten (to withstand high temperatures during equipment operation), and avoiding lattice deformation due to thermal effects during processing.

• Application Solution: Relying on a 5-axis femtosecond laser processing center, it can process hemispherical curved grids. The sub-micron positioning system ensures hole position consistency, and the heat-free zone prevents material deformation, providing customized samples for national defense, aerospace customers.

3. Ion Source Grids:

• Core Value: In semiconductor processes such as Ion Beam Etching (IBE) and Ion Beam Deposition (IBD), ion source grids are key components for "extracting and focusing ion beams." Through the synergy of multi-layer grids (screen grid, acceleration grid, deceleration grid), they "filter the plasma generated by the ion source into a directional beam" and control its energy and density, ultimately achieving high-precision etching or coating of wafers.

• Technical Requirements: Precise alignment of hole positions in multi-layer grids, burr-free and non-deformed grid holes, compatible with bombardment-resistant materials like molybdenum and tantalum, and burr-free grid hole edges (to avoid hole blockage caused by plasma adhesion).

• Application Solution: Relying on a sub-micron positioning system, it achieves high-precision square cutting. The cold processing feature ensures material corrosion resistance, meeting the needs of high-end semiconductor manufacturing.

MONO Femtosecond Laser: Solving Precision Challenges

1. No Heat-Affected Zone (HAZ), Zero-Damage Processing: With a pulse width of only 10⁻¹⁵ seconds, femtosecond laser energy acts on the material surface instantaneously and vaporizes it, with no heat conduction to the surrounding area, solving the deformation problem of refractory metals like tungsten and molybdenum and thin materials.

2. Sub-Micron Precision, Tolerance Controllable ±1μm: Equipped with a high-precision motion platform and visual positioning system, femtosecond laser can achieve ±1μm high-precision processing. Grid size, hole diameter, and spacing are strictly controlled to meet the narrow bar width requirements of TEM grids.

3. Broad Material Compatibility, Covering Full-Scenario Needs: Capable of processing metal materials such as copper, nickel, molybdenum, tungsten, and tantalum, adapting to the multi-material needs of TEM grids and the corrosion-resistant material needs of ion source grids (Nickel sheet grids, Molybdenum sheet grids, Tungsten sheet grids).

4. Complex Structure Adaptability, Breaking Process Limitations: Supports the processing of planar grids and 3D curved grid structures, coping with the curved trajectory of TWT hemispherical grids, the multi-layer hole alignment of ion source grids, and the integrated forming of micro-holes and other complex patterns, all achievable through femtosecond laser.

MONO: Your Manufacturing Partner

MONO provides high-end manufacturing solutions for customers in aerospace, medical, optical, semiconductor and other industries with advanced femtosecond laser technology and core equipment.

As one of the few domestic equipment providers focusing on femtosecond laser technology, we rely on rich grid structure processing experience and independently developed advanced femtosecond laser equipment series to accurately match diverse needs: whether it is TEM grids for research institutes, TWT grids for national defense enterprises, or filter/implant grids customized for medical device manufacturers, MONO can provide targeted customized solutions to help your product performance achieve advanced upgrades.